DUV lithography systems | Products - ASML
ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.
TWINSCAN NXT:2050i - DUV lithography machines - ASML
The TWINSCAN NXT:2050i is where state-of-the-art immersion lithography system design meets advanced lens design with a numerical aperture (NA) of 1.35 – the highest in the semiconductor industry right now. This step-and-scan system is a high-productivity, dual-stage tool designed for volume production.
EUV lithography systems – Products - ASML
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible. EUV lithography does big things on a tiny scale.
TWINSCAN NXT:2000i - DUV lithography systems - ASML
The TWINSCAN NXT:2000i includes a 1.35 NA 193 nm catadioptric projection lens that can achieve production resolutions down to 40 nm (C-quad) and 38 nm (dipole) and an in-line design supporting full 26 x 33 mm field size, 4X reduction and reticle compatibility with existing designs.
TWINSCAN: 20 years of lithography innovation - Stories | ASML
Aug 18, 2021 · The story of ASML’s TWINSCAN lithography platform – a revolution in photolithography, for chipmakers and for the semiconductor industry. Learn how ASML built a wafer table for two Saved jobs
ASML products & services | Supplying the semiconductor industry
Explore ASML products and services that optimize the chip-making process, including our advanced lithography machines and metrology tools.
TWINSCAN XT:1460K - DUV lithography machines - ASML
The TWINSCAN XT:1460K 193 nm step-and-scan system is a high-productivity, dual-stage ArF lithography tool designed for volume 300 mm wafer production at 65 nm resolution. The TWINSCAN XT:1460K contains a variable 0.93 NA 193 …
TWINSCAN NXE:3600D - EUV lithography systems - ASML
The TWINSCAN NXE:3600D combines imaging and overlay improvements with a 15% to 20% productivity improvement capability when compared to its predecessor, the NXE:3400C at dose 30mJ/cm2.
HMI eScan 1000 - Metrology & inspection systems - ASML
ASML’s HMI eScan 1000 is the world’s first multiple e-beam (multibeam) wafer inspection tool.
TWINSCAN NXT:1980Di - DUV lithography systems - ASML
The TWINSCAN NXT:1980Di includes a 1.35 NA 193 nm catadioptric projection lens that can achieve production resolutions down to 40 nm (C-quad) and 38 nm (dipole) and an in-line design supporting full 26 x 33 mm field size, 4X reduction and reticle compatibility with existing designs.
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