5 things you should know about High NA EUV lithography - ASML
Jan 25, 2024 · With its new stages, the TWINSCAN EXE:5000 can print more than 185 wafers per hour, an increase compared to the NXE systems already being used in high-volume manufacturing. And we have a roadmap for increasing that to 220 wafers per hour in 2025.
Intel and ASML strengthen their collaboration to drive High-NA …
Jan 19, 2022 · At the 2021 Investor Day, ASML shared its EUV roadmap and indicated that High-NA technology is expected to start supporting production manufacturing in 2025. Today's announcement is consistent with this roadmap.
ASML Unveils Plans for Next-Generation "Hyper-NA ...
Jun 13, 2024 · ASML, the world's sole provider of extreme ultraviolet (EUV) lithography systems essential for manufacturing the most advanced chips, has revealed its roadmap for pushing semiconductor scaling even further.
ASML High-NA Development Update: Coming to Fabs in 2024 - 2025 - AnandTech
May 26, 2022 · For post-3nm nodes, ASML and its partners are working on a brand-new EUV tool — the Twinscan EXE:5000-series — featuring a 0.55 NA (High-NA) lens capable of an 8nm resolution, which is...
Making EUV: from lab to fab – Stories - ASML
Mar 30, 2022 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn about the pivotal moments that happened on the way to launching ASML’s first EUV system, as well as a glimpse of what’s next.
This Machine Could Keep Moore's Law on Track - IEEE Spectrum
Jul 29, 2023 · The first high-NA EUV system, the ASML EXE:5000, will be installed in a new lab that we’re opening jointly with the Belgium-based nanoelectronics research facility Imec, in early 2024.
ASML sets new EUV chipmaking density record, proposes ...
May 28, 2024 · At imec’s ITF World 2024, ASML announced it set a new chipmaking density record with its first High-NA machine and proposed a Hyper-NA chipmaking tool and potential roadmaps.
EUV Light Source: Is the Future in a Particle Accelerator?
Jun 10, 2024 · ASML’s current light sources are rated at 500 watts. But for the even finer patterning needed in the future, Nakamura says it could take 1 kilowatt or more. ASML says it has a road map to ...
Sidebar on Intel EUV and ASML - Intel's Process Roadmap to ... - AnandTech
Jul 26, 2021 · ASML’s latest update suggests that it expects customers to be using High-NA for production in 2025/2026, which means that Intel is likely going to be getting the first machine (ASML NXE:5000 we...
ASML Updates EUV Roadmap - EE Times
Feb 28, 2018 · SAN JOSE, Calif. — ASML showed stepwise progress in an update on the performance of its latest extreme ultraviolet (EUV) lithography system and its roadmap at the SPIE Advanced Lithography conference here.