This technique is particularly valuable in the fields of electronics, sensors, and biomedical applications, where high-resolution patterns and the ability to work with various materials are essential.

EBL is a high-resolution lithography technique that uses a focused electron beam to write patterns on an electron-sensitive resist. For CFL mold fabrication, EBL is used to create patterns with ...

Abstract: The image quality obtained with high-resolution, CCD readout photon-counting detectors can be greatly affected by an image modulation or fixed pattern noise that results from errors in ...

However, the current use of negative resists in the semiconductor industry has been limited by past difficulties in achieving high-resolution patterns. Recent advances in the chemistry of ...

With unmatched sensitivity and dynamic range, Symmetry is suitable for even the most difficult applications, where low beam currents coupled with rapid, high-resolution patterns are a necessity.

high-resolution pattern display, improved screen performance and fast exposure ability. This deep-UV microLED display chip integrates the ultraviolet light source with the pattern on the mask.

High-NA EUV lithography makes it possible to form fine patterns on silicon wafers with a higher resolution than previously possible, and is expected to lead to the realization of high-performance ...